Speaker
Dr
Atsuhiko Ochi
(Kobe University (JP))
Description
New MPGD production method, forming resistive electrodes by metal/carbon sputtering, has been developed. Both fine electrodes structure (<50 micron) forming and large area production (>1m^2) are available using this method. The surface resistivity is controlled within a few tens percent of uniformity in the range of 100kΩ/sq. – 10MΩ/sq. Those properties are very useful for ATLAS MicroMEGAS production. We will report the development status and test results of prototype MicroMEGAS using sputtered resistive anodes for ATLAS muon upgrade.
