24–26 May 2017
Rayong Marriott Resort & Spa
Asia/Bangkok timezone

Control the Crystal Growth of Al-doped ZnO Thin Film Prepared by Pulsed Laser Deposition and The Influences on Its Optical and Electrical Properties

24 May 2017, 15:10
50m
Rayong Marriott Resort & Spa

Rayong Marriott Resort & Spa

http://www.marriott.com/hotels/travel/bkkrr-rayong-marriott-resort-and-spa/ Rayong, Thailand
Poster Surface, Interface and Thin Film Poster Presentation I

Speaker

Mr Narathon Khemasiri (College of Nanotechnology, King Mongkut’s Institute of Technology Ladkrabang, Chalongkrung Rd., Ladkrabang)

Description

Transparent conducting thin film is an important layer determining the efficiency of optoelectronic devices. Materials shown the wide-range transparency together with high conductivity are of interest. Among materials providing such optical and electrical properties, metal-doped ZnO is a promising material that gain tremendous attractions. In this work, highly transparent and highly conductive thin films of Al-doped ZnO (AZO) are achieved by pulsed laser deposition (PLD). By changing the substrate temperature in the range of room temperature to 500 $^\text{o}$C during the deposition process, the preferential growth direction of AZO crystal is controlled and, as a consequence, the surface morphology, optical and electrical properties of AZO thin film are able to be manipulated. X-ray diffractrograms as a function of substrate temperature clearly illustrate the ability to control the preferential growth direction of AZO. At the low substrate temperature, the growth along [002] direction corresponding to c-axis of hexagonal ZnO is only observed. By elevating substrate temperature, not only crystallinity of AZO thin film is further improved but also the competition of crystal growth along the [002], [001] and [101] directions are occurred due to the increase of total energy and surface mobility of adatom. The AZO films obtained by all preparation conditions exhibit an n-type semiconducting characteristics, furthermore, the carrier concentration and the carrier mobility of AZO thin films can be optimized to reach 4.10×10$^\text{20}$ cm$^\text{-3}$ and 7.53 cm$^\text{2}$/Vs, respectively. The excellences in both carrier concentration and mobility of AZO thin film lead to very low resistivity of 2.08×10$^\text{-3}$ $\Omega$ cm. In addition, the wide optical band gap of ~3.50 eV together with the high transparency over 85% is obtained from the AZO thin films. The exceptional optical and electrical properties of AZO thin film demonstrate that such material has enough potential to become a promising candidate using in optoelectronic applications.

Primary author

Mr Narathon Khemasiri (College of Nanotechnology, King Mongkut’s Institute of Technology Ladkrabang, Chalongkrung Rd., Ladkrabang)

Co-authors

Dr Navaphun Kayunkid (College of Nanotechnology, King Mongkut’s Institute of Technology Ladkrabang) Mr Sukittiya Jessadaluk (College of Nanotechnology, King Mongkut’s Institute of Technology Ladkrabang) Dr Sakon Rahong (College of Nanotechnology, King Mongkut’s Institute of Technology Ladkrabang) Dr Adirek Rangkasikorn (College of Nanotechnology, King Mongkut’s Institute of Technology Ladkrabang) Dr Supamas Wirunchit (College of Nanotechnology, King Mongkut’s Institute of Technology Ladkrabang) Dr Annop Klamchuen (National Nanotechnology Center) Prof. Jiti Nukeaw (College of Nanotechnology, King Mongkut’s Institute of Technology Ladkrabang)

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