15-20 October 2017
Europe/Zurich timezone

Experimental Study of Matching Network with Different Frequency for RF Ion Source

17 Oct 2017, 16:30
2h 30m


Centre international de Conférence Genève (CICG). http://www.cicg.ch/
Poster presentation Ion sources for fusion Poster Session 2


Dr Caichao jiang (Institute of Plasma Physics, Chinese Academy Sciences)


The radio frequency (RF) ion source has the potential of steady-state operation which due to it has no filament. Compares to the traditional arc based ion source, the RF power should couples into the plasma through the matching network. So, the matching network is much important for the RF ion source. Due to the plasma impedance will be changed before and after the plasma generation, the impedance characteristic is not easy to be calculated and measured. In order to get higher RF power couple efficiency, the matching network was studied through the experimental on the RF ion source test stand.
The matching network was designed with different frequency (1 MHz and 2 MHz) on the RF ion source test bed. The key parameters of capacitances on matching network were calculated. Two adjustable capacitances were used on the matching network due to the change of plasma impedance in the driver. The matching characteristic was investigated with the 50kW RF generator with 1 MHz and 10 kW RF generator with 2 MHz. It will be helpful for the design and operation of matching network of RF ion source with different RF frequency. The long pulse RF discharge was also tested with the best matching status. The details of the results will be presented in this paper.

Primary authors

Dr Caichao jiang (Institute of Plasma Physics, Chinese Academy Sciences) Prof. Chundong Hu (Institute of Plasma Physics,Chinese Academy of Sciences) Dr Yahong xie (Chinese Academy of Sciences) Mr Shiyong chen Mr Qinglong cui Mr Yuming gu Prof. Yuanlai Xie (Institute of Plasma Physics, Chinese Academy of Sciences)

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