Speaker
Mr
Tachgiss Jampreecha
(Suranaree university of technology)
Description
Cu-doped BiFeO$_3$ thin films were fabricated by spin coating method. The thin films were deposited on Pt/Si-N type substrate. X-rays diffraction were used to reveal purity and impurity of Cu-doped BiFeO$_3$ thin films crystalline structure on Cu-doping concentration as 0, 0.1, 0.2, 0.5 and 1.0, respectively. X-ray absorption spectroscopy (XAS) were used to investigate Fe and Cu elements oxidation state. Scanning electron microscopy (SEM) were used to show surface morphology of Cu-doped BiFeO$_3$ thin films and thin films thickness (SEM Cross Section). Agilent4294A Impedance Analyzer were used to reveal dielectric constant and conductivity of thin films.
Primary authors
Mr
Tachgiss Jampreecha
(Suranaree university of technology)
Dr
Jessada khajonrita
(Suranaree university of technology)
Prof.
Worawat Meevasana
(Suranaree university of technology)
Prof.
Santi Maensiri
(Suranaree university of technology)
