High Power Impulse Magnetron Sputtering Technology and its Applications

by Dr Arutiun P. EHIASARIAN (Head of HIPIMS Technology Centre)

Thursday 15 Jul 2010, 10:00 → 11:00 Europe/Zurich

6/2-004 (CERN)

The seminar deals with HIPIMS – the latest technological innovation in physical vapour deposition – which uses sputtering at high energy density of kWcm-2 and produces highly ionised metal and gas flux. The strengths of the method are to enhance coating adhesion by promoting local epitaxial growth on polycrystalline substrates. HIPIMS can produce fully dense coatings and coat high aspect ratio (30:1) vias.

Slides Ehiasarian.pdf