Planar Sensor 1
- Yoshinobu Unno (High Energy Accelerator Research Organization (JP))
Derek Axel Strom (Vrije Universiteit Brussel (BE))
2/17/15, 11:20 AM
With an active area of 200 square meters and 10 million readout channels, the CMS silicon strip tracker is the largest silicon detector ever constructed. We present the latest status and results of the detector following the first LHC long shutdown and as CMS prepares for the next high-energy discovery run. Results from detector calibration and commissioning, radiation measurements and...
Anna Macchiolo (Max-Planck-Institut fuer Physik (Werner-Heisenberg-Institut) (D)
2/17/15, 11:40 AM
Thin planar pixel modules are promising candidates to instrument the inner layers of the new ATLAS pixel detector for HL-LHC, thanks to the reduced contribution to the material budget and their high charge collection efficiency after irradiation. 100-200 um thick sensors, interconnected to FE-I3 and FE-I4 read-out chips, have been characterized with radioactive source scans and beam tests at...
Dr Thomas Bergauer (HEPHY Vienna)
2/17/15, 12:00 PM
All modern particle physics experiments use silicon-based sensors for their vertex and tracking systems. The largest single device built so far is the CMS Tracker with more than 24,000 sensors, each made on a 6” silicon wafer. An academic institution cannot perform such a large production, and even the number of potential commercial vendors is small. Therefore we are developing planar silicon...
Nicola Neri (Università degli Studi e INFN Milano (IT))
2/17/15, 12:20 PM
We report on the status of the R&D of the first prototype of a silicon tracking system with “artificial retina” for fast track finding. The “artificial retina” is a tracking algorithm inspired by neurobiology and based on extensive parallelization of data distribution and pattern recognition. It allows real time tracking and can be designed to work for HEP applications, i.e. high rates and...
Jasu Haerkoenen (Helsinki Institute of Physics (FI))
2/17/15, 12:40 PM
Atomic Layer Deposition (ALD) method is a derivate of more commonly adopted Chemical Vapor Phase Deposition (CVD) thin film growth methods. The deposition of a film by ALD is based on the successive, separated and self-terminating gas–solid reactions of typically two gaseous reactants. Separation of the reactants is accomplished by pulsing a purge gas (for instance oxygen, nitrogen or argon)...