Speaker
Dr
Alireza Nassiri
(Argonne National Laboratory - DOE)
Description
Modern microfabrication techniques based on deep X-ray lithography (LIGA), capable of producing high-aspect-ratio structures, are attractive and can be considered for the fabrication of metallic or dielectric planar structures suitable for high-frequency rf cavities and rf power sources. This paper will present an overview of this technology and a summary of work done at Argonne and elsewhere.
* Work supported by U.S. Department of Energy, Office of Science, Office of Basic Energy Sciences, under Contract No. DE-AC02-06CH11357.
