6-22 November 2017
CERN
Europe/Zurich timezone

Epitaxial wafer trends in industry

7 Nov 2017, 09:05
1h
IdeaSquare (CERN)

IdeaSquare

CERN

Description

Speaker: P. Collareta (GW-SEMI)

Silicon CVD epitaxy has been used in the semiconductor industry since the early 60’s and continues to be one of the most important techniques for advanced microelectronics. The aim of this presentation is to review the process and the reactors used to deposit silicon epitaxial layers, to present the typical crystallographic defects of these layers and their influence on the device performance and to review the requirement of the CMOS Image sensors, one the most growing application. A short overview of the silicon wafers and epitaxial wafers market is then presented.

Presentation Materials