Speaker
Yong Wang
(University of Science and Technology of China)
Description
Amorphous carbon (a-C) thin film applied to vacuum chambers of high-energy particle accelerators can decrease secondary electron yield（SEY）and suppress electron-cloud effectively. A dc magnetron sputtering apparatus to obtain a-C film has been designed. With the equipment, a-C thin film can be deposited on the inner face of stainless steel pipes ultimately which is uniform and high-quality. Meanwhile, it is found that a-C has a low SEY＜1.2 measured by the secondary electron emission measurement set-up in the National Synchrotron Radiation Laboratory. The result indicates that a-C is an ideal material for modern accelerators.
Author
Yong Wang
(University of Science and Technology of China)
Co-author
Bo Zhang
(University of Science and Technology of China)
