The effects of annealing temperature on the structural and electrical properties of tin dioxide () thin films were systematically studied for a gas sensing application. Tin dioxide thin films with different number of layers and annealing temperature were prepared on indium tin oxide substrates by sol-gel dip-coating technique. SEM micrographs show that the approximately grain size of the thin films increased with increasing number of layers and annealing temperature. X-ray diffraction analysis showed that the thin film was tetragonal at 400 ⁰C. The calculating crystallite size from Scherrer’s formula was about 40-60 nm. Dielectric property of desired thin films was investigated by LCR meter. It was found that the dielectric constant decrease when the frequency of applied signal and annealing temperature increases. Those properties of films were promising for electronics devices like gas sensor.
Authors
ถนอมรัตน์ พฤกษ์เจริญPANYA Khaenamkaew(Kasetsart University)
Ms
Dhonluck Manop(Department of Basic Science and Physical Education,Faculty of Science at Si Racha, Kasetsart University, Chonburi, 20230, Thailand)
Mr
Chaileok Tanghengjaroen(Department of Basic Science and Physical Education,Faculty of Science at Si Racha, Kasetsart University, Chonburi, 20230, Thailand)
Mr
Worasit Palakawong Na Ayuthaya(Department of Resources and Environment, Faculty of Science at Si Racha, Kasetsart University, Chonburi, 20230, Thailand)