Speaker
Ronald Meisels
(Montanuniversitaet)
Description
Replacing 193 nm UV-radiation, extreme ultraviolet (EUV) radiation of 13.5 nm wavelength has entered commercial microelectronics production. Further progress and novel applications like microscopy of biological specimens require a further reduction of the wavelength to the sub-10-nm range (“Beyond EUV” - BEUV), e.g. the water window (2.33 nm to 4.4 nm). In this wavelength range multilayer mirrors are used instead of refractive optical components, e.g. alternating Cr/Sc structures at 3.12 nm. Their reflectivity spectra are far narrower than emission spectra of BEUV sources. In a numerical study we use grading of the layer thicknesses to widen the reflectivity spectra to collect more of the radiation and increase the optical throughput.
Primary authors
Prof.
Friedemar Kuchar
(Montanuniversitaet)
Ronald Meisels
(Montanuniversitaet)
