Speaker
Description
Developing and understanding novel quantum materials pushes angle-resolved photoemission (ARPES) into new frontiers of resolution and extreme conditions. ULTRA endstation at the SIS beamline of the Swiss Light Source is a novel system for high-resolution ARPES at temperatures down to 4 K. With independent 6-axis control, minimal thermal drift, deflector scanning, and easy alignment, ULTRA is not only powerful, but also user-friendly and geared toward high-throughput spectroscopy. A newly added instrument cluster for in situ film growth and scanning probe techniques enables cutting-edge investigations of oxide films and heterostructures. I will summarize the present status of ULTRA, highlight recent science, and discuss future plans, including integration into SLS 2.0.