Validation of TCAD simulations of the edge of planar silicon sensors to understand breakdown

4 Feb 2025, 16:05
1m
Sala Stringa (FBK, Trento)

Sala Stringa

FBK, Trento

Via Sommarive 18 38123 Povo di Trento ITALY
Poster Simulations Poster Session

Speaker

Peilin Li (Humboldt Universität zu Berlin)

Description

Silicon sensors are widely used in high-energy physics due to their low material budget and radiation hardness. However, they are susceptible to surface breakdown, particularly under humid conditions. This study aims to improve the understanding of the underlying mechanisms by developing new methods to probe the electric field at the sensor’s edge. For planar sensors, avalanche breakdown primarily occurs at the Si-SiO$_{2}$-interface, where localized electric field peaks can form between the guard ring and the edge. The local electric field is influenced by defects at the oxide surface and interface as well as the geometry of the sensor. Therefore, accurate simulations are challenging and it is essential to validate simulation parameters by comparing the simulation results to measurements.

In this work, the edge region of planar silicon diodes was simulated using Synopsis TCAD. Current, capacitance, and Transient Current Technique (TCT) simulations were performed and compared to measurements. Additionally, Allpix Squared simulations were used to determine whether the surface electric field at the edge can be extracted from top TCT measurements with 660 nm laser pulses using the prompt current method, similar to edge TCT.

Authors

Ben Brüers (Deutsches Elektronen-Synchrotron (DESY)) Ingo Bloch (Deutsches Elektronen-Synchrotron (DESY)) Heiko Lacker (Humboldt Universität zu Berlin) Peilin Li (Humboldt Universität zu Berlin) Ilona Ninca (Deutsches Elektronen-Synchrotron (DESY)) Christian Scharf (Humboldt Universität zu Berlin)

Presentation materials