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Summary
The Low Resistance Strip Sensors Project was approved in June 2011, since then the working group has been working on the technological and layout definition of the structures. With respect to the technological feasibility and variations several wafers have been fabricated in the CNM clean room trying a variety of technological options. The measurement performed so far have demonstrated the feasibility of the project and have given indication on the best options for the processing. With respect to the layout definition, a design of experiments have been planed to assure the functionality of the PT structures in order to be able to check their effectiveness optimization subject of the project. Miniature barrel-type strip sensors have been designed with the experiment variations, and some specifically designed test structures have also been created. At this point the final mask designs and the full process steps are being defined.