Speaker
Description
Magnetron sputtering is one of the most widely employed techniques for depositing metallic and insulating thin films on a variety of substrates. Its versatility lies in the precise control it offers over film thickness and morphology, which can be tuned by deepening our understanding of key aspects of the sputtering process: ionization of the working gas, plasma dynamics, sputtering of the target material, and subsequent deposition on the substrate. Such control is especially important in the development of particular high-energy physics detectors, where thin, uniform, and functional coatings—such as those used in hybrid Resistive Plate Chambers (RPCs)—play a crucial role in enhancing detector performance, stability, and signal quality.
A particularly promising approach to advancing this understanding is through the study of the light emitted by the plasma. The emission provides a window into the identity, density, and dynamics of atoms and ions from both the working gas and the sputtered material. However, most previous measurements have either been limited to external observation outside the vacuum chamber or relied on methods that disturb the plasma environment.
To overcome these limitations, we are developing a high-timing-precision, multi-parameter optical monitoring system to probe the plasma light directly within the chamber. The setup samples plasma emission at critical points along the path from target to substrate, achieving a timing resolution of up to 320 picoseconds. It employs quartz optical fibers strategically placed inside the vacuum chamber, connected via a dedicated feedthrough to an external optical measurement system. The readout system uses Silicon Photomultipliers (SiPMs) mounted on a custom-designed board to capture and analyze the light signals.
This experimental framework provides critical insight into the formation and evolution of magnetron plasmas, enabling us to better understand and address issues that affect thin-film growth. Ultimately, such studies will inform the optimization of coatings for advanced detector systems in high-energy physics, ensuring improved functionality, reliability, and scalability for future collider experiments.
This work is supported under TÜBİTAK Grant No: 124F091.
| Position | Professor |
|---|---|
| Affiliation | Istanbul Beykent University, Istanbul |
| Country | Turkey |