Name: Training on semiconductor devices, design and manufacturing
Start: 2013-07-01T08:00:00+02:00
End: 2013-07-02T19:15:00+02:00
Location: Katane Palace Hotel, Catania (Italy)

Training on semiconductor devices, design and manufacturing

from Monday 1 July 2013 (08:00) to Tuesday 2 July 2013 (19:15)

Monday 1 July 2013

08:15 Registration
Registration
08:15 - 08:45
08:45 Welcome and Introduction to the Course - Massimo Mazzillo (STMicroelectronics)
Welcome and Introduction to the Course
- Massimo Mazzillo (STMicroelectronics)
08:45 - 09:00
09:00 Semiconductor Manufacturing Processes
09:00 - 14:00
Contributions

09:00 Brief Introduction of STMicroelectronics and Microelectronics Historical Notes - Giuseppe Arena (STMicroelectronics)

09:30 Semiconductors Processing and Devices Fabrication - 1st part (crystal growth and epitaxy, thermal oxidation, ion implantation and diffusion) - Giuseppe Arena (STMicroelectronics)

11:00 Semiconductors Processing and Devices Fabrication – 2nd part (Thin film deposition, photolithography, plasma basics, etching and new trends in microelectronics industry) - Giuseppe Arena (ST Microelectronics)
14:00 Electrical Testing, Assembly and TCAD Simulations.
14:00 - 16:50
Contributions

14:00 Electrical Parametric Testing - Stefano Sannella (ST)

14:50 Electronic Devices Packaging - Federico Ziglioli (STMicroelectronics)

15:40 TCAD Process and Device Simulations - Cristina Miccoli (STMicroelectronics)
16:50 Technology Development and Applications
16:50 - 18:30
Contributions

16:50 STMicroelectronics Silicon Photomultiplier Technology - Giuseppina Valvo (ST Microelectronics)

17:40 Time-of-Flight PET Detector Development with SiPMs - Sergei Dolinsky (GE Global Research Center)
18:30 Social dinner
Social dinner
18:30 - 20:30
Tuesday 2 July 2013
08:15 Visit to STMicroelectronics M5 8” Clean Room Facilities
08:15 - 14:30
Contributions

08:15 First Group Visit (19 Participants)

10:45 Second Group Visit (19 Participants)
14:30 Surface Analysis and Solids Characterization
14:30 - 18:50
Contributions

14:30 X-Ray Photoelectron Spectroscopy (XPS) and Secondary Ion Mass Spectrometry (SIMS) - Lucio Renna (ST Microelectronics)

15:30 Optical Microscopy, Fault Detection and Isolation Techniques - Domenico Mello (ST Microelectronics)

16:50 Samples Preparation and Transmission Electron Microscopy (TEM) - Domenico Mello (ST Microelectronics)

17:50 Focused Ion Beam (FIB) and Scanning Electron Microscopy (SEM) - Domenico Mello (ST)
18:50 Conclusions and Debriefing
Conclusions and Debriefing
18:50 - 19:00

Choose timezone