12–16 Sept 2005
Heidelberg
Europe/Zurich timezone

Session

Plenary Session P2

P2
13 Sept 2005, 09:00
Heidelberg

Heidelberg

Germany

Presentation materials

There are no materials yet.

  1. Dr Ehrenfried Seebacher (Austriamicrosystems)
    13/09/2005, 09:00
    We discuss state of the art and new developments for the characterization of CMOS technologies. In the first chapter the most important issues of MOS transistor modeling will be shown. Topics like AC/DC modeling, noise modeling and temperature modeling for the MOS transistor will be explained. State of the art MOS transistor models like the BSIM3 and BSIM4 models as well as the...
    Go to contribution page
  2. Dr Massimo Manghisoni (Università degli Studi di Bergamo)
    13/09/2005, 09:45
    Oral
    Deep submicron CMOS technologies are widely used for the implementation of low noise front-end electronics in various detector applications. In this field the designers’ effort is presently focused on 0.13 micron technologies. This work presents the results of noise measurements carried out on CMOS devices in 0.13 um commercial processes from different foundries. The study also...
    Go to contribution page
  3. Dr Marcel Stanitzki (Yale University)
    13/09/2005, 10:10
    Oral
    The CDF Silicon Vertex detector consists of three subdetectors: SVX-II, ISL and L00. Altogether it consists of 8 layers of Silicon with more than 750000 readout channels. This detector is essential for CDF's high precision tracking and is vital for the forward tracking capabilities and the identification of heavy flavor decays. After four years of data taking in Run-II and a delivered...
    Go to contribution page
Building timetable...