Speaker
Prof.
Meisels Ronald
(Montanuniversitaet)
Description
The extreme ultraviolet (EUV) is of particular interest for future lithography replacing 193 nm UV by, e.g., 13.5 nm radiation from Sn plasma. Here, instead of lenses Mo/Si multilayer structures are considered. These structures are one-dimensional photonic crystals (1D-PhCs).
In this work, the EUV reflectivity of more complex PhCs are studied. For example, by replacing every 4th Mo layer by Si a 1D superlattice PhC is constructed. 3D PhC studied have, e.g., the woodpile structure (layers of parallel rods, with the rods in adjacent layers oriented perpendicularly).
The reflectivity is calculated using the multiple scattering method and the FDTD method.
Primary authors
Prof.
Meisels Ronald
(Montanuniversitaet)
Prof.
Freidemar Kuchar
(Montanuniversitaet)
