Speaker
Mauro Audi
(Agilent Technologies Vacuum Division )
Description
Ion pumps are widely used in very sensitive applications such as Particle Accelerators and Electron Microscopes , where particles emitted from the vacuum pumps can heavily affect the performance of the machine or the resolution of the instrument .
Neutral and charged particle emission from ion pumps has been analyzed and its dependance on pressure, operating voltage and element geometry is discussed .
Optical shields are a common solution to limit particle emission , but the resulting conductance limitation is usually a major concern for the performance of the pump itself .
A specific ion pump element designed to minimize the particle emission while maintaining a high fraction of the original puming speed is described
Author
Mauro Audi
(Agilent Technologies Vacuum Division )
Co-authors
Paolo Manassero
(Agilent Technologies Vacuum Division)
Chiara Paolini
(Agilent Technologies Vacuum Division)