17–22 Jun 2018
Europe/Zurich timezone
15th European Vacuum Conference

Hollow cathode discharge for the deposition of amorphous carbon thin films.

22 Jun 2018, 11:30
20m
Room 4 (CICG)

Room 4

CICG

Contributed Plasma Science & Technology Plasma Science and Technology

Speaker

Antonios Sapountzis (CERN)

Description

Amorphous carbon thin films with a low Secondary Electron Yield, (SEY), of about 1 can be obtained by sputtering from graphite targets. These coatings have proven to mitigate electron multipacting in particle accelerators and their usefulness depends on the practical applicability to the inner surfaces of the beam pipes. In this contribution we present the development of the sputtering technology, based on the hollow cathode effect, to coat the vacuum chambers of the magnets of the CERN Super Proton Synchrotron “in-situ” (without removing the magnets from their position in the accelerator ring). The glow discharge is characterised by the impedance at different pressures and for different gases (Ar and Ne). The flux and energy distribution function of the ions bombarding the substrate are measured with a retarding field energy analyser. Film thickness and morphology are assessed by scanning electron microscopy and the SEY is measured in an in-house built setup. The optimisation of the coating parameters is discussed.

Primary author

Pedro Costa Pinto (CERN)

Co-authors

Antonios Sapountzis (CERN) Thibaut Richard (EPFL - Ecole Polytechnique Federale Lausanne (CH)) Dr Mauro Taborelli (CERN) Wilhelmus Vollenberg (CERN)

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