Conveners
Plasma Science and Technology
- Jörg Patscheider (Evatec AG)
Plasma Science and Technology
- Jörg Patscheider (Evatec AG)
The common definition of “surface” includes surface atoms and molecules,
practically extending at the most three layers – typically up to one
nanometer. This definition is justified by the fact that many surface
properties such as chemistry, wettability or charge density are determined by
the top most surface layer. Far less explored are effects due to interactions
with deeper subsurface...
Energy distributions of ions in magnetron discharges and ion transport away from the target (cathode) are still not fully understood. In this talk we will provide new insights on this topic. Our measurements suggest that the energy and spatial distributions of ions are related to the phenomenon of spokes. In magnetron discharges, azimuthally non-uniform plasma structures are referred to as...
DC bias diode and DC magnetron sputtering are used at CERN for thin film deposition on vacuum components of various sizes, geometries, substrate and coating materials, e.g. amorphous carbon or non-evaporable getter on stainless steel, or niobium on copper radio-frequency accelerating cavities for particle accelerators.
In this context, numerical simulations are studied in order to get insight...
For many thin film applications, such as optical coatings, energy-related coatings, hard coatings, etc., the coated layers are not single metal thin films, but rather compound coatings obtained from at least one metal (e.g. Al, Ti) or a non-metal (e.g. C, B) and a reactive gas (e.g. O2, N2). This talk will address a promising thin film deposition technology called high...
Amorphous carbon thin films with a low Secondary Electron Yield, (SEY), of about 1 can be obtained by sputtering from graphite targets. These coatings have proven to mitigate electron multipacting in particle accelerators and their usefulness depends on the practical applicability to the inner surfaces of the beam pipes. In this contribution we present the development of the sputtering...
There are two major interests in thin film process development: higher quality thin film deposition at lower temperature conditions, and larger area deposition at lower costs of operation. Plasma-enhanced deposition is very useful both for temperature lowering and large area deposition at lower costs, and in addition, it is known that atmospheric operation of plasma-enhanced chemical vapor...
