Speaker
Description
We will report on a templated electrochemical technique for patterning arrays of single-crystalline Si nanowires with feature dimensions down to 5 nm. This technique, termed three-dimensional electrochemical axial lithography (3DEAL),[1] allows the design and parallel fabrication of hybrid silicon nanowire arrays decorated with complex metal nano-ring architectures in a flexible and modular approach. 3DEAL is based on simple chemical and electrochemical approaches that were developed previously[2] and can produce homogeneous macroscale metal-Si wire arrays.
[1] F. J., Wendisch, M. Saller, A. Eadie, A. Reyer, M. Musso, M. Rey, N. Vogel, O. Diwald, G. R. Bourret Nano Letters 2018, 18, 11, 7343-7349
[2] T. Ozel, G. R. Bourret and C. A. Mirkin Nat. Nanotech. 2015, 10, 319–324
