Speaker
Description
Plasma fusion devices will require plasma-facing components (PFCs) which can withstand the extreme environment at the edge of a hot fusion plasma [1]. Studies of materials suitability for fusion PFCs require experiments that can simulate the ion bombardment associated with fusion edge plasmas [2-3]. High fluence ion implantation is one tool for this purpose. The Bradley group at the University of Saskatchewan has been developing Plasma Immersion Ion Implantation (PIII) as a tool for this and other materials science applications requiring high ion fluence. High fluence ion implantation for this work is being conducted in the custom USask PIII system developed by the Bradley group, consisting of an Inductively Coupled Plasma and a custom high-voltage modulator [4-6]. This talk will review the physics underlying high fluence ion implantation using PIII, as well as some recent applications including those related to fusion PFC materials testing.
References
[1] T. Hirai et al., “Use of tungsten material for the ITER divertor”, Nuclear Materials and Energy 9, pp. 616-622 (2016).
[2] M. J. Baldwin and R. P. Doerner, “Formation of helium induced nanostructure ‘fuzz’ on various tungsten grades,” J. Nucl. Mater. 404, no. 3, pp. 165–173 (2010).
[3] K. Tokunaga et al., “Blister formation and deuterium retention on tungsten exposed to low energy and high flux deuterium plasma,” J. Nucl. Mater., 337–339, pp. 887–891 (2005).
[4] M. Risch and M.P. Bradley, “Prospects for Band Gap Engineering by Plasma Ion Implantation”, physica status solidi (c) 6, S210-S213 (2009).
[5] C.J.T. Steenkamp and M.P. Bradley, “Active Charge/Discharge IGBT Modulator for Marx Generator and Plasma Applications”, IEEE Trans. Plasma Sci. 35, 473-478 (2007).
[6] J. Moreno, A. Khodaee, D. Okerstrom, M.P. Bradley, and L. Couëdel, “Time-resolved evolution of plasma parameters in a plasma immersion ion implantation source”, Physics of Plasmas 28, 123523 (2021).