Study of Behaviour of n-in-p Silicon Sensor Structures Before and After Irradiation

18 Feb 2013, 16:40
20m
"Stringa" Conference Hall (FBK, Trento)

"Stringa" Conference Hall

FBK, Trento

Via Sommarive, 18 38123 Povo - Trento ITALY

Speaker

Yoshinobu Unno (High Energy Accelerator Research Organization (JP))

Description

Radiation-tolerant n-in-p silicon sensors were developed for use in very high radiation environments. Novel n-in-p silicon strip and pixel sensors and test structures were fabricated, tested and evaluated, in order to understand the designs implemented. The resistance between the n-implants (interstrip resistance), the electric potential of the p-stop, and the punch-through-protection (PTP) onset voltage, leakage current breakdown at n-implant at very high voltage were measured before and as a function of fluence after irradiation. The technology computer-aided design (TCAD) simulations were used to understand the radiation damage and fluence dependence of the behavior of structures.

Author

Yoshinobu Unno (High Energy Accelerator Research Organization (JP))

Presentation materials