Study of Behaviour of n-in-p Silicon Sensor Structures Before and After Irradiation

18 Feb 2013, 16:40
20m
"Stringa" Conference Hall (FBK, Trento)

"Stringa" Conference Hall

FBK, Trento

Via Sommarive, 18 38123 Povo - Trento ITALY

Speaker

Yoshinobu Unno (High Energy Accelerator Research Organization (JP))

Description

Radiation-tolerant n-in-p silicon sensors were developed for use in very high radiation environments. Novel n-in-p silicon strip and pixel sensors and test structures were fabricated, tested and evaluated, in order to understand the designs implemented. The resistance between the n-implants (interstrip resistance), the electric potential of the p-stop, and the punch-through-protection (PTP) onset voltage, leakage current breakdown at n-implant at very high voltage were measured before and as a function of fluence after irradiation. The technology computer-aided design (TCAD) simulations were used to understand the radiation damage and fluence dependence of the behavior of structures.

Primary author

Yoshinobu Unno (High Energy Accelerator Research Organization (JP))

Presentation materials