8-10 June 2016
Asia/Bangkok timezone

Characteristic investigation of sputtered Co-Cu films on glass substrate

Jun 9, 2016, 1:45 PM
Room E1

Room E1

Oral presentaion Surface, Interface and Thin Films Session XXIX


Ms Suthasinee Somboonsap (Kasetsart University)


A series of sputtered Cox-Cu100-x films with different compositions (x = 88, 76, 65, 52, 38 and 34) were prepared by RF-sputtering process on glass substrate under 10-3 mbar of Ar pressure. XRD results presented both of Co (FCC) and Cu (FCC) phases in (111) plane at 2 = 44.23° and 43.34°, respectively. The intensity of Cu peaks was increased likewise the intensity Co peaks was decreased with increasing Cu composition. Morphology of all deposited films showed the columnar structures. The maximum and minimum surface roughness was observed on Co38Cu62 and Co88Cu12 films, respectively. At the temperature of around 600°C, DTA curves showed endothermic peak representing oxidation reaction of Co and Cu phases. Magnetic properties were investigated by MOKE technique under an applied magnetic field from -44.59 to 44.59 mT. The Co88Cu12, Co76Cu24 and Co65Cu35 films exhibited ferromagnetic phase whereas the Co38Cu62 and Co34Cu66 films showed paramagnetic phase. The maximum coercivity of about 15.1 mT and the minimum of about 1.7 mT were observed on Co88Cu12 and Co52Cu48 films, respectively. It can be concluded that the composition strongly effects on structure, morphology and magnetic properties of the films.

Primary author

Ms Suthasinee Somboonsap (Kasetsart University)


Ms Watcharee Rattanasakulthong (Kasetsart University)

Presentation materials