18–20 Nov 2020
Europe/Zagreb timezone

The boron-oxygen (BiOi) defect complex induced by irradiation with 23 GeV protons in p-type epitaxial silicon diodes

18 Nov 2020, 10:00
20m

Speaker

Mr Chuan Liao (Hamburg University (DE))

Description

In this work the Thermally Stimulated Current (TSC) technique has been used to investigate the properties of the radiation induced BiOi defect complex by 23 GeV protons, including activation energy, capture cross section, defect concentration as well as the annealing behavior. At first isothermal annealing (at 80 °C for 0 to 180 minutes) followed by isochronal annealing (for 15 minutes between 100 °C and 180 °C in steps of 10 °C ) studies had been performed in order to get information about the thermal stability of the BiOi defect in 50 Ω cm material after irradiation with 23 GeV protons to a fluence of 6.91×1013 p/cm². The results will be presented and discussed. Furthermore, the extracted data from TSC measurements are compared with the macroscopic properties derived from current-voltage (I-V) and capacitance-voltage (C-V) characteristics. In addition the introduction rate of BiOi as function of the initial doping concentration was determined by exposing diodes with different resistivity (10 Ωcm, 50 Ωcm, 250 Ωcm, and 2 kΩcm) to 23 GeV protons. These results will be compared with data from DLTS measurements achieved by the team of the RD50 “Acceptor removal project”.

Authors

Mr Chuan Liao (Hamburg University (DE)) Prof. Eckhart Fretwurst (university of hamburg) Prof. Erika Garutti (university of hamburg) Dr Joern Schwandt (university of hamburg) Yana Gurimskaya (CERN) Isidre Mateu Michael Moll (CERN) Marcos Fernandez Garcia (Universidad de Cantabria and CSIC (ES)) Leonid Makarenko (B) Ioana Pintilie (NIMP Bucharest-Magurele, Romania)

Presentation materials