Speaker
Ms
Xiting Zhou
Description
β-Ga2O3 gratings were fabricated by inductively-coupled-plasma (ICP) etching process to have a clearer understanding of dry etching mechanism during semiconductor device manufacturing process. Different parameters were adjusted to investigate their effects and find the best etching recipe.
Author
Ms
Xiting Zhou
Co-authors
Prof.
David Lewis
Mr
Yong Cheow Lim
Prof.
Yan Jiao
Prof.
Nelson Tansu
Dr
Philip van Eyk
Dr
Petar Atanackovic