Speaker
Luke Mawst
Description
We employ nanopatterning, via diblock co-polymer lithography, and selective area-MOVPE growth to achieve high-density InGaN/GaN quantum dots for UV applications
Author
Co-authors
CHENG LIU
Chirag Gupta
Dominic Lane
Jian Sun
Miguel A. Betancourt Ponce
Nelson Tansu
Mr
Nikhil Pokharel
(University of Wisconsin Madison)
Padma Gopalan
Shubhra S. Pasayat