Speaker
Pichai Sirisangsawang
(Scientific Equipment Center, Faculty of Science, Kasetsart University, Bangkok, THAILAND 10900)
Description
Aluminum-doped ZnO (ZnO:Al) film was prepared by RF-sputtering on glass, A-PET, C-PET substrates. XRD confirms that sputtered ZnO:Al films shows a polycrystalline wurtzite structure with c-axis perpendicular to the substrate in (002) direction. The highest and lowest peak intensities were observed on the films deposited on glass and C-PET substrates, respectively. SEM result shows the difference of surface morphology of sputtered ZnO:Al film on A-PET, C-PET substrates. The film on A-PET substrate shows the columnar structure of the oval grain shape whereas the C-PET substrate displays the island structure of the spherical grain shape. EDS also confirms that the atomic percent of Zn element of the film on C-PET substrates is slightly higher than that on A-PET substrate. The average transmission in 900-1400 nm of the film on A-PET and C-PET substrates is about 80%. The averaged transmission in visible region of the film on A-PET and C-PET substrates is about 75% and 80%. It can be concluded that the structure, morphology and optical transmission of sputtered ZnO:Al film are substrate material dependent and the flexible material can be an appropriate substrate to improve the properties of deposited films.
Primary author
Pichai Sirisangsawang
(Scientific Equipment Center, Faculty of Science, Kasetsart University, Bangkok, THAILAND 10900)
Co-author
Dr
Watcharee Rattanasakulthong
(Department of Physics, Faculty of Science, Kasetsart University, Bangkok, THAILAND 10900)
