Speaker
Ms
Panadda Waruriya
(Department of Physics and Materials Science, Faculty of Science, Chiang Mai University,Huay Kaew Road, Muang District, Chiang Mai, Thailand, 50200)
Description
Reactive pulsed dc magnetron sputtering technique is highly effective in thin film deposition, particularly thin film of dielectric materials. In this work, we design and set up reactive pulsed dc magnetron sputtering system for deposition of Titanium Nitride (TiN) and Titanium Nitride-Hydroxyapatite (TiN-HA).
Suitable plasma conditions for deposition are analyzed using the current-voltage characteristic and optical emission spectroscopy. In this experiment, the pulsing parameters (frequency and duty cycle) and glow discharge parameters (voltage and pressure) are varied.
Author
Ms
Panadda Waruriya
(Department of Physics and Materials Science, Faculty of Science, Chiang Mai University,Huay Kaew Road, Muang District, Chiang Mai, Thailand, 50200)
Co-authors
Dr
Prissana Thamboon
(Science and Technology Research Institute, Chiang Mai University,Thailand)
Prof.
dheerawan Boonyawan
(Department of Physics and Materials Science, Faculty of Science, Chiang Mai University,Huay Kaew Road, Muang District, Chiang Mai, Thailand, 50200)
