20-22 May 2015
Asia/Bangkok timezone
The Centennial Celebration of General Relativity Theory and 80 Years of Thai Physics Graduate

Characterization of Plasma Conditions for Reactive Pulsed DC Magnetron Sputtering System

20 May 2015, 14:00
3h 30m
Board: PLA-06
Poster presentation Ion and Plasma Physics Poster-1

Speaker

Ms Panadda Waruriya (Department of Physics and Materials Science, Faculty of Science, Chiang Mai University,Huay Kaew Road, Muang District, Chiang Mai, Thailand, 50200)

Description

Reactive pulsed dc magnetron sputtering technique is highly effective in thin film deposition, particularly thin film of dielectric materials. In this work, we design and set up reactive pulsed dc magnetron sputtering system for deposition of Titanium Nitride (TiN) and Titanium Nitride-Hydroxyapatite (TiN-HA). Suitable plasma conditions for deposition are analyzed using the current-voltage characteristic and optical emission spectroscopy. In this experiment, the pulsing parameters (frequency and duty cycle) and glow discharge parameters (voltage and pressure) are varied.

Primary author

Ms Panadda Waruriya (Department of Physics and Materials Science, Faculty of Science, Chiang Mai University,Huay Kaew Road, Muang District, Chiang Mai, Thailand, 50200)

Co-authors

Dr Prissana Thamboon (Science and Technology Research Institute, Chiang Mai University,Thailand) Prof. dheerawan Boonyawan (Department of Physics and Materials Science, Faculty of Science, Chiang Mai University,Huay Kaew Road, Muang District, Chiang Mai, Thailand, 50200)

Presentation Materials