20-22 May 2015
Asia/Bangkok timezone
The Centennial Celebration of General Relativity Theory and 80 Years of Thai Physics Graduate

Micron-size Electrodes Fabrication for Capacitively Coupled Contactless Conductivity Detection (C$^4$D)

21 May 2015, 08:00
3h
Board: INS-03
Poster presentation Instrumentation, Metrology and Standards Poster-2

Speaker

Ms Jongrak Sanglao (Department of Physics and Materials Science, Faculty of science,Chiang Mai University, Chiang Mai, 50200, Thailand)

Description

Capacitively Coupled Contactless Conductivity Detection (C$^4$D) is the detection technique used to detect both charged and non-charged particles in solution when performing electrophoretic separation in microfluidic devices. With the C$^4$D electrodes not directly exposed to solution, contamination of detecting specimen can be avoided. In this work, the new planar micro-size C$^4$D electrodes on a glass slide fabrication technique based on Printed Circuit Board (PCB) patterning was developed to be used with microfluidic device. The negative dry film photoresist used was Dupont Riston FX-515 with the thickness of 15 microns. The opening area size in the photoresist film down to 50 microns was achieved using 15 second exposure of 400 nm – wavelength light source, and 30 seconds development time in 0.85% Na$_2$CO$_3$ solution. The patterned glass slide was deposited with approximately 20 nm-thick gold thin film using sputtering technique to create the gold C$^4$D electrodes.

Primary author

Ms Jongrak Sanglao (Department of Physics and Materials Science, Faculty of science,Chiang Mai University, Chiang Mai, 50200, Thailand)

Co-authors

Mr Korkuson Masean (Department of Physics and Materials Science, Faculty of science,Chiang Mai University, Chiang Mai, 50200, Thailand) Dr Nirut Pussadee (Plasma and Beam Physics Research Facility, Department of Physics and Materials Science, Faculty of science ,Chiang Mai University, Chiang Mai, 50200, Thailand)

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