21–23 Jun 2021
Europe/Zurich timezone

The boron-oxygen (BiOi) defect complex induced by irradiation with 6 MeV electrons in p-type silicon diodes

Speaker

Mr Chuan Liao (Hamburg University (DE))

Description

Abstract: The radiation induced BiOi defect complex by 6 MeV electrons in low resistivity (10 Wcm) p-type epitaxial silicon diodes has been studied using the Thermally Stimulated Current (TSC) and the Thermally Stimulated Capacitance (TS-Cap) technique. The fluence values were in the range between 1 × 1015 e/cm2 and 6 × 1015 e/cm2. The extracted results on the activation energy, defect concentration as well as the isothermal annealing behavior at 80 oC will be presented and discussed in comparison with data from TSC and DLTS(Deep Level Transient Spectroscopy) measurements achieved by the team of the CERN-RD50 “Acceptor removal project”. In addition, the extracted microscopic data are compared with results from capacitance-voltage (C-V) characteristics.

Authors

Anja Himmerlich (CERN) Mr Chuan Liao (Hamburg University (DE)) Eckhart Fretwurst (Hamburg University (DE)) Erika Garutti (University of Hamburg) Ioana Pintilie (NIMP Bucharest-Magurele, Romania) Joern Schwandt (Hamburg University (DE)) Leonid Makarenko (Byelorussian State University (BY)) Micheal Moll UNKNOWN (CERN) Yana Gurimskaya (Universite de Geneve (CH))

Presentation materials