Speaker
Description
Chemical solution deposition (CSD) is a very competitive cost-effective deposition technique which has been used to obtain nanocomposite REBCO films and CCs, however their growth rates is rather small (0.5-1 nm/s) when the BaF2 route is used. To address this challenge, we have developed a novel growth approach, entitled Transient Liquid Assisted Growth (TLAG) [1], which is able to combine CSD of non-fluorine precursors with ultrahigh growth rates mediated by a non-equilibrium transient liquid (100-1000 nm/s), being compatible with nanocomposite structures including BaMO3 (M=Zr, Hf) nanoparticles [2,3]. High critical current densities have been achieved up of 5 MA/cm2 at 77K in thin films and the process has been transferred to thicker films and metallic substrates. In this presentation, we will discuss on the careful selection of non-fluorine solutions and nanoparticle synthesis to keep the nanoscale homogeneity of the film precursors [4]. In-situ analysis of the growth process by synchrotron radiation XRD and resistivity experiments has been crucial tools to pinpoint the kinetics aspects of this non-equilibrium process [1,3,5]. We also correlate the nanostructure of these films investigated by transmission electron microscopy with the vortex pinning landscape studied by the magnetic field, temperature and angular dependences measurements of the critical currents [1,6].
We acknowledge funding from EU ULTRASUPERTAPE (ERC_AdG-2014-669504) and IMPACT (PoC-2020) projects, from MCIU/AEI/FEDER for SUPERENERTECH (PID2021-127297OB-C21) and the Excellence Program Severo Ochoa (CEX2019-000917-S).
[1] L. Soler et al, Nature Communications,11, 344 (2020)
[2] S. Rasi et al, J. Phys. Chem. C, 124, 15574 (2020)
[3] A. Queraltó et al, ACS Appl. Mater. Interfaces, 13, 9101 (2021)
[4] L. Saltarelli et al, ACS Appl Materials and Interfaces, 14, 48582 (2022)
[5] S. Rasi et al, Advance Science, 9, 2203834 (2022)
[6] A. Stangl et al., Sci. Rep., 11, 8176 (2021)
