2–7 Sept 2012
Hotel Listel Inawashiro, Inawashiro, Japan
Japan timezone

A study on the dynamic range of integrating SOI chips

4 Sept 2012, 15:20
1h
Hotel Listel Inawashiro, Inawashiro, Japan

Hotel Listel Inawashiro, Inawashiro, Japan

Kawageta, Inawashiro, Fukushima 969-2696
POSTER Pixel technologies - Monolithic detectors Poster session

Speaker

Yasuo Arai (High Energy Accelerator Research Organization (JP))

Description

In the SOI process developed by KEK and LAPIS, transistors can be divided into two groups by their nominal power supply, 1.8V and 2.5V respectively. All the past integrating SOI chips use 1.8V transistors in core circuit and 2.5V in IO buffers. To verify the idea of increasing dynamic range of integrating charge, a chip using 2.5V transistors in core circuit was submitted to MPW run in 2011. The test results show that an increasement of 50% of dynamic range can be achieved by this way.

Primary author

Dr Yunpeng Lu (Institute of High Energy Physics, Beijing)

Presentation materials