Training on semiconductor devices, design and manufacturing

Name: Training on semiconductor devices, design and manufacturing
Start: 2013-07-01T08:00:00+02:00
End: 2013-07-02T19:15:00+02:00
Location: Katane Palace Hotel, Catania (Italy)

1–2 Jul 2013

Katane Palace Hotel, Catania (Italy)

Europe/Zurich timezone

Overview
Timetable
Contribution List
Book of Abstracts
Registration
Participant List
Accommodation & Venue
Back to PicoSEC-MC Net webpage

Support

rita.giuffredi@cern.ch

Focused Ion Beam (FIB) and Scanning Electron Microscopy (SEM)

2 Jul 2013, 17:50

Katane Palace Hotel, Catania (Italy)

Via Finocchiaro Aprile, 110 - Catania (Italy)

Surface Analysis and Solids Characterization

Dr Domenico Mello (ST)

Slides

04_-_SEM.pdf

05-_Focused_Ion_Beam.pdf

06_-_Lamella.pdf

Training on semiconductor devices, design and manufacturing

Support

Focused Ion Beam (FIB) and Scanning Electron Microscopy (SEM)

Katane Palace Hotel, Catania (Italy)

Speaker

Presentation materials

Choose timezone

Training on semiconductor devices, design and manufacturing

Support

Speaker

Presentation materials