Training on semiconductor devices, design and manufacturing

Name: Training on semiconductor devices, design and manufacturing
Start: 2013-07-01T08:00:00+02:00
End: 2013-07-02T19:15:00+02:00
Location: Katane Palace Hotel, Catania (Italy)

1–2 Jul 2013

Katane Palace Hotel, Catania (Italy)

Europe/Zurich timezone

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rita.giuffredi@cern.ch

Semiconductors Processing and Devices Fabrication – 2nd part (Thin film deposition, photolithography, plasma basics, etching and new trends in microelectronics industry)

1 Jul 2013, 11:00

1h 30m

Katane Palace Hotel, Catania (Italy)

Via Finocchiaro Aprile, 110 - Catania (Italy)

Semiconductor Manufacturing Processes

Dr Giuseppe Arena (ST Microelectronics)

Slides

3_ARENA_PLASMA_THIN_FILMS_CVD_PVD.pdf

4_ARENA_LITHO_ETCH_CMP.pdf

5_ARENA_TRENDS_and_FINAL_REMARKS.pdf

Training on semiconductor devices, design and manufacturing

Support

Semiconductors Processing and Devices Fabrication – 2nd part (Thin film deposition, photolithography, plasma basics, etching and new trends in microelectronics industry)

Katane Palace Hotel, Catania (Italy)

Speaker

Presentation materials

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Training on semiconductor devices, design and manufacturing

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Speaker

Presentation materials