Training on semiconductor devices, design and manufacturing

Name: Training on semiconductor devices, design and manufacturing
Start: 2013-07-01T08:00:00+02:00
End: 2013-07-02T19:15:00+02:00
Location: Katane Palace Hotel, Catania (Italy)

1–2 Jul 2013

Katane Palace Hotel, Catania (Italy)

Europe/Zurich timezone

Support

rita.giuffredi@cern.ch

Semiconductors Processing and Devices Fabrication - 1st part (crystal growth and epitaxy, thermal oxidation, ion implantation and diffusion)

1 Jul 2013, 09:30

1h 10m

Katane Palace Hotel, Catania (Italy)

Via Finocchiaro Aprile, 110 - Catania (Italy)

Semiconductor Manufacturing Processes

Dr Giuseppe Arena (STMicroelectronics)

Slides

2_ARENA_EPI_THERM_OX_ION_IMPL_DIFF.pdf

Training on semiconductor devices, design and manufacturing

Support

Semiconductors Processing and Devices Fabrication - 1st part (crystal growth and epitaxy, thermal oxidation, ion implantation and diffusion)

Katane Palace Hotel, Catania (Italy)

Speaker

Presentation materials

Choose timezone

Training on semiconductor devices, design and manufacturing

Support

Speaker

Presentation materials