Training on semiconductor devices, design and manufacturing

Name: Training on semiconductor devices, design and manufacturing
Start: 2013-07-01T08:00:00+02:00
End: 2013-07-02T19:15:00+02:00
Location: Katane Palace Hotel, Catania (Italy)

1–2 Jul 2013

Katane Palace Hotel, Catania (Italy)

Europe/Zurich timezone

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Back to PicoSEC-MC Net webpage

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rita.giuffredi@cern.ch

Optical Microscopy, Fault Detection and Isolation Techniques

2 Jul 2013, 15:30

Katane Palace Hotel, Catania (Italy)

Via Finocchiaro Aprile, 110 - Catania (Italy)

Surface Analysis and Solids Characterization

Dr Domenico Mello (ST Microelectronics)

Slides

00_-_Outline.pdf

01_-Failure_analysis.pdf

Training on semiconductor devices, design and manufacturing

Support

Optical Microscopy, Fault Detection and Isolation Techniques

Katane Palace Hotel, Catania (Italy)

Speaker

Presentation materials

Choose timezone

Training on semiconductor devices, design and manufacturing

Support

Speaker

Presentation materials