Linear mode reach through APD for X-ray imaging in 0.2μm SOI-CMOS technology

10 Dec 2017, 21:22
1m
Conference Center (Okinawa Institute of Science and Technology Graduate University (OIST))

Conference Center

Okinawa Institute of Science and Technology Graduate University (OIST)

OIST, Onna, Okinawa 904-0495, Japan
POSTER SOI detectors POSTER

Speaker

Ryutaro Hamasaki (SOKENDAI)

Description

Prototype of an Avalanche Photodiodes with Reach-Through (RT-APD) was
fabricated using Silicon On Insulator (SOI) technology. It replaces a pixel sensor with
the silicon APD to detect soft X-ray which generate very small charge. These new
devices offer fast proportional response and good S/N based on linear mode operated at
below breakdown voltage. In this study, to investigate edge termination effect, the
RT-APD prototype was fabricated and the results of current-voltage characteristics with
different guard ring width and also photon sensitivity in order to evaluate multiplication
gain were measured. These RT-APD sensors are composed of N+/P-well/P-substrate.
The wafer type is floating zone with 200 μm thick and its resistivity is around 6k Ωcm.
Potential and electric field distribution was also analyzed with TCAD simulation.

Author

Co-authors

Mr Akihiro Koyama (University of Tokyo) Prof. Kurachi Ikuo (High Energy Accelerator Research Organization) Toshinobu Miyoshi (KEK) Yasuo Arai (High Energy Accelerator Research Organization (JP))

Presentation materials