The paper reviews recent results of further developments and applications with several options generating pure boron plasmas for ion beam formation and surface modifications. The following methods of generation of boron plasma were used:
$\bullet$ igniting and keeping alive cathode spots in vacuum arc with pure boron cathode;
$\bullet$ self-sputtering mode of planar magnetron discharge with pure boron target;
$\bullet$ operation of planar magnetron discharge with pure boron target at medium range frequency;
$\bullet$ electron beam evaporation and ionization of pure boron substrate at fore-vacuum pressure.
Special features of the generation of boron plasma are described; results of measurement plasma parameters are presented as well as some physical mechanisms of boron plasma generation are discussed.
The work was supported by Russian Science Foundation under grant # 16-19-10034.