15-20 October 2017
Europe/Zurich timezone

Compact H$^{+}$ ECR Ion Source with Pulse Gas Valve

16 Oct 2017, 16:30
2h 30m


Centre international de Conférence Genève (CICG). http://www.cicg.ch/
Poster presentation Production of high intensity ion beams Poster Session 1


Yoshihisa Iwashita (Kyoto University)


Compact H$^{+}$ ECR Ion Source using permanent magnets is under development. A pulsed gas injection system, achieved by a fast piezo gas valve, can reduce the gas load to a vacuum evacuation system. This feature is suitable when the ion source is closely located to an RFQ. Use of permanent magnets reduces the size. Achieved performance will be presented.

Primary author

Yoshihisa Iwashita (Kyoto University)


Hiromu Tongu (Kyoto University) Yasuhiro Fuwa (Kyoto University) Yusuke Takeuchi (Kyoto University) Yuki Yamazaki (Kyoto University) Ryo Katayama (Kyoto University)

Presentation materials

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