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12–14 Nov 2007
CERN
Europe/Zurich timezone

Cluster related hole traps with enhanced-electric-field-emission- the source for long term annealing in hadron irradiated silicon diodes -

13 Nov 2007, 13:50
20m
40-S2-C01 (CERN)

40-S2-C01

CERN

Defect and Material Characterization Defect and Material Characterization & New Materials

Speaker

Ioana Pintilie (NIMP Bucharest)

Description

Cluster related defects were investigated by the Thermally Stimulated Current (TSC) method in neutron irradiated n-type Si diodes during 80C annealing. Three hole traps proved to have an electric-field-enhanced emission characteristic for Coulombic wells. Their zero field emission rates were obtained describing the TSC peaks with the three-dimensional Poole Frenkel formalism when accounting for the spatial distribution of the diodes electric field. As acceptors in the lower half of the gap these centers have a direct impact on the effective doping of the n-type diodes. They are revealed as causing the long-term annealing effects.

Primary author

Ioana Pintilie (NIMP Bucharest)

Co-authors

Eckhart Fretwurst (Hamburg University, Institute for Experimental Physics) Gunnar Lindstroem (Hamburg University, Institute for Experimental Physics)

Presentation materials