16–20 Sept 2024
Bat. 100, Université Paris-Saclay, France
Europe/Zurich timezone

HiPIMS Deposition of Nb Coatings with Bias Voltage: Preparation and Characterization at IHEP

16 Sept 2024, 17:05
23m
Auditorium Joliot-Curie (Bat. 100, Université Paris-Saclay, France)

Auditorium Joliot-Curie

Bat. 100, Université Paris-Saclay, France

Batiment 100, Orsay Campus
Nb thin film technology Nb thin film technology

Speaker

Haichang Duan (IHEP)

Description

The Nb/Cu film superconducting cavities offer several enhancements over traditional bulk niobium RF cavities, including improved mechanical and thermal stability, as well as a reduced sensitivity to DC magnetic fields. Despite these advantages, Nb/Cu film cavities produced via DC magnetron sputtering often exhibit a pronounced Q-slope issue, potentially due to the low-energy deposition process. In contrast, high power impulse magnetron sputtering (HiPIMS) allows for greater peak power by employing a small duty cycle, to generate a higher ionization rates of target atoms, which in turn can control the deposition energy of the particles through the substrate bias voltage adjustments, thereby improving film quality. Therefore, we developed the application of HiPIMS with bias voltage for the preparation of Nb films by adding a cylindrical mesh as an anode on the previous 1.3 GHz dummy cavity coating system.

Presentation materials