"Magnetron sputtering (MS) is a common technique used for the production of thin films. In such process, the sputtered ions are ejected from the target material with high kinetic energy and deposited onto the substrate to form the coating. This result in an energy transfer between the bombarding particles and substrate, affecting film growth or crystallization.
While DC and pulse DC are...
Coating the inner surface of superconducting radio frequency (SRF) cavities is one of the approaches to push ultimate limits in next generation accelerators. One of the potential coating techniques for such intricate and large volume structures is atomic layer deposition (ALD), as it offers full and uniform layer coverage. In order to predict the process parameters for coating SRF cavities on...
