13–15 Nov 2013
CERN
Europe/Zurich timezone

Irradiated n-in-p planar pixel sensors of different thicknesses and active edge designs

15 Nov 2013, 11:10
20m
CERN

CERN

503-1-001 (Council Chamber) on 13th Nov & 222-R-001 (Filtration Plant) on 14th & 15th Nov.

Speaker

Stefano Terzo (Max-Planck-Institut fuer Physik (Werner-Heisenberg-Institut) (D)

Description

We present results of the characterization of n-in-p planar pixel modules employing 100 and 200 µm thin sensors with active edges produced at VTT, Finland, and 150 µm thin sensors produced at MPP/HLL. These are interconnected with bump bonding to either FE-I3 or FE-I4 ATLAS read-out chips and irradiated up to a fluence of 1e16. A comparison of the performance of the different sensor thicknesses and studies of the edge properties for the VTT sensors have been performed with radioactive sources in the laboratory and using precise beam test measurements with 120 GeV pions at CERN SpS and 4 GeV electrons at DESY, Hamburg.

Primary author

Stefano Terzo (Max-Planck-Institut fuer Physik (Werner-Heisenberg-Institut) (D)

Co-author

Anna Macchiolo (Max-Planck-Institut fuer Physik (Werner-Heisenberg-Institut) (D)

Presentation materials